Procédés de précision

Équipement Semi-conducteur

Pour réaliser les tests de qualité requis pour
produire des masques de haute performance,
JEOL propose désormais les CD-SEM Holon,
modèles EMU-220 et EMU-330.

EMU-220/330 CD-SEM for Mask Measurement
EMU-220/330EMU-220/330
Miniaturization of feature sizes for Optical Proximity Correction (OPC) masks and phase shift masks is accelerating, according to the International Roadmap for Semiconductor Technology. To achieve high-quality testing required to produce these high-performance masks, JEOL now offers the Holon Mask CD-SEM models EMU-220 and EMU-330.

Features

  • Highly stable observation and measurement of patterns on NGL photo masks
  • High-precision measurement by electrostatic EB scan
  • Charge neutralizer for low charge control
  • Anti-contamination device for low contamination
  • Image measurement system