Lithographie par faisceau d'électrons

Équipement Semi-conducteur

Grande gamme d'outils e-beam,
pour les masques, la lithographie écriture directe,
aussi bien pour les gros volumes de production
que pour la recherche avancée et le développement.

The JBX-6300FS, equipped with a thermal field emission electron gun with a ZrO/W emitter, is an electron beam lithography system provided with the Vector Scan Method for beam deflection. The beam deflection employs 19bit DAC, and the accelerating voltage 25kV or 50kV or 100kV is selectable. The workpiece stage is driven by the step-and repeat-method, and up to 200 mm wafer can be loaded.

An auto-loader is provided for continuous unattended operation of up to 10 cassettes

The operation system (OS) of the computer for lithography control and JOB making are done in UNIX. Combination of UNIX and GUI (Graphical User Interface) has realized a high operation efficiency.

Exposure Method Vector scan, spot beam
Accelerating Voltage 25 kV / 50 kV / 100 kV
Electron Gun Emitter ZrO/W (Schottky)
Minimum Beam Size 2nm
Loading System Auto loader
Substrate Size Maximum 200mm dia.